PR-33-S refractive instrument for semiconductor industry

User 's Manual

PR-33-S refractive instrument for semiconductor industry is suitable for semiconductor liquid chemical measurement. The refraction instrument is compact in shape and the flow tank is made of modified ultra-pure PTFE, which is suitable for the measurement of semiconductor liquid chemicals. It can be connected with a ¼ to 1-inch Pilar Pillar or flares with flares.K-PATENTS® Semiconductor industry refraction machines PR-33-S for chemical concentration monitoring in wafer cleanrooms, commonly installed on mixing, cleaning, etching, and (CMP) machines. The PR-33-S contains an ultra-pure modified PTFE flow cell body and an Ethernet cable through which power over Ethernet (PoE) switches of different standards can be used to power the sensor and transfer data to the computer. PR-33-S monitors the chemical concentration in real time, and when the chemical concentration exceeds the specified range, it immediately gives an alarm through the Ethernet feedback. For example, low and high concentration alarms can be configured to control and extend the service life of the solution.The concentration here is determined by measuring the refractive index of the solution, nD, and temperature. PR-33-S is installed directly through a flare or pillar fitting. PR-33-S is compact, metal-free and small in size.

Traceability calibration and validation under N.I.S.T. standard using standard refractive index liquids and validation procedures

Optical core design

Data logging and remote interface operation over Ethernet

Standard UDP/IP communication

Standard UDP/IP communication process temperature range: -20°C -- 85°C (-4°F -- 185°F)

Built-in Pt1000 fast temperature measurement and automatic temperature compensation

Main Advantages:

Fully digital equipment: Vessala K PATENTS® semiconductor industry with the opticator PR-33-S for process monitoring, can provide continuous Ethernet output signals, compact design, can be directly connected in series on the process pipeline.

Maintain accurate and stable measurement at full scale：Refractive measurement range nD 1.3200 -- 1.5300, equivalent to 0 -- 100% (weight percentage). For high concentration HF, the optional range is nD 1.2600-1.4700. Nominal accuracy is R.I.+ 0.0002, usually equivalent to 0.1% (as a percentage by weight), for example, hydrochloric acid concentration. The measurement is not affected by particles, bubbles, turbulence and PPM concentration level trace impurities.

Easy to maintain：Optical core design, no drift, no recalibration, no mechanical adjustment.